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Mentor Graphics Extends Calibre Technology to Address Mask Data Preparation Bottleneck
WILSONVILLE, Ore.--(BUSINESS WIRE)--Oct. 2, 2001--Mentor Graphics
Corporation (Nasdaq:MENT), today announced a strategic extension of
its Calibre® technology, the industry standard in integrated circuit
(IC) physical verification and manufacturability, to include the
capability to export IC layout data directly into mask-writer formats.
Mask data preparation (MDP) is a serious bottleneck in the
semiconductor industry, with data volumes exploding as dimensions
shrink and data-intensive resolution enhancement technology (RET) is
adopted. If data is handled incorrectly or flattened too early in the
process, the volume of IC data can increase by a factor of 10 or more.
This increase creates a disproportionate increase in mask-writing and
inspection time, severely impacting capital equipment utilization for
mask manufacturers.
This extension of Calibre, based on its powerful hierarchical
engine, preserves design hierarchy well into the mask data preparation
stage. It allows users to continue using and developing RET for
advanced IC lithography while avoiding the complications and problems
of data volume and hierarchy management of previous MDP solutions. It
also eliminates the need for a stand-alone fracturing utility and an
extra conversion to a closed, proprietary intermediate data format.
The MDP problem has become so critical that SEMI, the worldwide
semiconductor equipment and materials standards organization, has
initiated a task force to address interoperability issues that occur
between the design automation and mask-making communities.
To ensure the write-time efficiency of the export data generated
by Calibre, Mentor Graphics has worked closely with mask-writer
equipment engineers and advanced mask manufacturers.
``In 1996, Calibre brought modern hierarchy to DRC/LVS; in 1999,
the Calibre architecture was extended to hierarchical RET. This year,
our customers gave us compelling reasons to extend into MDP and
complete the flow,'' said Joseph Sawicki, general manager, Calibre
Business Unit. ``We are very pleased at the collaboration with the mask
equipment industry and leading-edge customers who want a modern,
complete solution for design-to-silicon needs, especially at the 130
and 100nm nodes.''
Fundamentals of Mask Data Preparation
MDP contains three basic steps: geometry-processing, export to
mask-writer formats and frame-generation/reticle layout. As design
sizes escalate, and RET is used more aggressively at 0.13 micron and
below, the first two of these steps become very difficult due to
increased data volume. Frame generation is generally not impacted by
these changes.
MDP geometry-processing includes such steps as layer derivation,
Booleans, sizing, mask rule checking (MRC), mask proximity correction
(MPC) and planarization fill, which are far more efficiently processed
in open, standard hierarchical design formats, such as GDSII. Calibre
has been in commercial use for MDP/tape-out geometry processing for
many years at semiconductor companies worldwide, with recent adoption
at major mask suppliers as well.
MDP export to mask-writer formats is the process of converting
hierarchical design data in an open, standard hierarchical format to a
proprietary format optimized for specific mask-writer equipment. This
export step should be reserved to the last possible moment before
reticle manufacture to preserve the inherent efficiency of
industry-standard hierarchical processing.
Calibre Technology
Calibre's advanced geometric processing takes advantage of the
repetition inherent in modern IC designs. Rather than processing a
cell and duplicating it each time it occurs in a design, Calibre
selectively processes the hierarchical design data, using
sophisticated database algorithms, such as Hierarchical Injection(TM)
and Selective Promotion(TM), as well as parallel processing and
patent-pending MDP-specific innovations. Calibre preserves hierarchy
during verification, OPC and MDP geometry-processing, greatly reducing
the amount of data to be processed at export time. Calibre carefully
optimizes the exported data shapes and data volume for fast mask-write
time to minimize cost-of-ownership.
Availability
Intensive mask-writer-format export testing at customer sites has
been in progress since June 2001 with expanded testing phases planned
throughout the second half of 2001. Calibre MDP technology will be
commercially available in the first half of 2002 beginning with the
MEBES format. A follow-up announcement will provide product details,
availability and pricing for mask-writer export formats. Advanced
vector shaped-beam formats are currently in development.
About Mentor Graphics Corporation
Mentor Graphics Corporation (Nasdaq:MENT) is a world leader in
electronic hardware and software design solutions, providing products,
consulting services and award-winning support for the world's most
successful electronics and semiconductor companies. Established in
1981, the company reported revenues over the last 12 months of more
than $600 million and employs approximately 2,975 people worldwide.
Corporate headquarters are located at 8005 S.W. Boeckman Road,
Wilsonville, Oregon, 97070-7777; Silicon Valley headquarters are
located at 1001 Ridder Park Drive, San Jose, California 95131-2314.
World Wide Web site: http://www.mentor.com.
Mentor Graphics and Calibre are registered trademarks of Mentor
Graphics Corporation. Hierarchical Injection and Selective Promotion
are trademarks of Mentor Graphics Corporation.
Contact:
Mentor Graphics
Nan Gage, 503/685-1809
nan_gage@mentor.com
or
Benjamin Group/BSMG Worldwide
Kara Lakkees, 503/283-8800
kara_lakkees@benjamingroup.com
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